Deep Reactive Ion Etching of Single Crystal 4H-SiC

Agency: NATIONAL AERONAUTICS AND SPACE ADMINISTRATION
State: Federal
Level of Government: Federal
Category:
  • 93 - Nonmetallic Fabricated Materials
Opps ID: NBD00159616324448324
Posted Date: Apr 22, 2024
Due Date: Apr 29, 2024
Solicitation No: 80NSSC24867518Q
Source: Members Only
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Deep Reactive Ion Etching of Single Crystal 4H-SiC
Active
Contract Opportunity
Notice ID
80NSSC24867518Q
Related Notice
Department/Ind. Agency
NATIONAL AERONAUTICS AND SPACE ADMINISTRATION
Sub-tier
NATIONAL AERONAUTICS AND SPACE ADMINISTRATION
Office
NASA SHARED SERVICES CENTER
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General Information
  • Contract Opportunity Type: Solicitation (Original)
  • All Dates/Times are: (UTC-05:00) CENTRAL STANDARD TIME, CHICAGO, USA
  • Original Published Date: Apr 22, 2024 01:54 pm CDT
  • Original Date Offers Due: Apr 29, 2024 02:00 pm CDT
  • Inactive Policy: 15 days after date offers due
  • Original Inactive Date: May 14, 2024
  • Initiative:
    • None
Classification
  • Original Set Aside: Total Small Business Set-Aside (FAR 19.5)
  • Product Service Code: 9390 - MISCELLANEOUS FABRICATED NONMETALLIC MATERIALS
  • NAICS Code:
    • 334519 - Other Measuring and Controlling Device Manufacturing
  • Place of Performance:
Description

Please see attached SOW and RFQ.


Attachments/Links
Contact Information
Contracting Office Address
  • JERRY HLASS ROAD, BLDG. 1111
  • STENNIS SPACE CENTER , MS 39529
  • USA
Primary Point of Contact
Secondary Point of Contact


History
  • Apr 22, 2024 01:54 pm CDTSolicitation (Original)

Related Document

May 1, 2024[Solicitation (Updated)] Deep Reactive Ion Etching of Single Crystal 4H-SiC

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